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Decomposing Mechanism of SF(6) under Positive DC Partial Discharge in the Presence of Trace H(2)O
[Image: see text] The influence of H(2)O on SF(6) decomposition characteristics under positive DC partial discharge (PD) is significant. To evaluate PD fault severity in DC SF(6)-insulated equipment using the production characteristics of SF(6) decomposition components, the corresponding relationshi...
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2020
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7288718/ https://www.ncbi.nlm.nih.gov/pubmed/32548525 http://dx.doi.org/10.1021/acsomega.0c01591 |