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Decomposing Mechanism of SF(6) under Positive DC Partial Discharge in the Presence of Trace H(2)O
[Image: see text] The influence of H(2)O on SF(6) decomposition characteristics under positive DC partial discharge (PD) is significant. To evaluate PD fault severity in DC SF(6)-insulated equipment using the production characteristics of SF(6) decomposition components, the corresponding relationshi...
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Formato: | Online Artículo Texto |
Lenguaje: | English |
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American Chemical Society
2020
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7288718/ https://www.ncbi.nlm.nih.gov/pubmed/32548525 http://dx.doi.org/10.1021/acsomega.0c01591 |
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author | Liu, Min |
author_facet | Liu, Min |
author_sort | Liu, Min |
collection | PubMed |
description | [Image: see text] The influence of H(2)O on SF(6) decomposition characteristics under positive DC partial discharge (PD) is significant. To evaluate PD fault severity in DC SF(6)-insulated equipment using the production characteristics of SF(6) decomposition components, the corresponding relationship and mathematical expression between the production of SF(6) decomposition components and the H(2)O content should be identified and achieved. Thus, SF(6) decomposition experiments under positive DC PD are performed to reflect the influence of H(2)O on SF(6) decomposition components. Results show that the total discharge quantity and the discharge repetition rate averaged for 1 s decrease slightly when the H(2)O content increases from 0 to 970 ppmv and then increase when the H(2)O content increases from 970 to 5120 ppmv. The effective production rates of SO(2)F(2), SOF(2), and SO(2) increase with the H(2)O content, whereas that of SOF(4) decreases. Finally, the corresponding relationship and mathematical expression between the characteristic ratio (c(SO(2)F(2)) + c(SOF(4)))/(c(SOF(2)) + c(SO(2))) of components and the H(2)O content have been achieved, which can afford references for PD fault diagnosis in DC SF(6) gas-insulated equipment. |
format | Online Article Text |
id | pubmed-7288718 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2020 |
publisher | American Chemical Society |
record_format | MEDLINE/PubMed |
spelling | pubmed-72887182020-06-15 Decomposing Mechanism of SF(6) under Positive DC Partial Discharge in the Presence of Trace H(2)O Liu, Min ACS Omega [Image: see text] The influence of H(2)O on SF(6) decomposition characteristics under positive DC partial discharge (PD) is significant. To evaluate PD fault severity in DC SF(6)-insulated equipment using the production characteristics of SF(6) decomposition components, the corresponding relationship and mathematical expression between the production of SF(6) decomposition components and the H(2)O content should be identified and achieved. Thus, SF(6) decomposition experiments under positive DC PD are performed to reflect the influence of H(2)O on SF(6) decomposition components. Results show that the total discharge quantity and the discharge repetition rate averaged for 1 s decrease slightly when the H(2)O content increases from 0 to 970 ppmv and then increase when the H(2)O content increases from 970 to 5120 ppmv. The effective production rates of SO(2)F(2), SOF(2), and SO(2) increase with the H(2)O content, whereas that of SOF(4) decreases. Finally, the corresponding relationship and mathematical expression between the characteristic ratio (c(SO(2)F(2)) + c(SOF(4)))/(c(SOF(2)) + c(SO(2))) of components and the H(2)O content have been achieved, which can afford references for PD fault diagnosis in DC SF(6) gas-insulated equipment. American Chemical Society 2020-05-29 /pmc/articles/PMC7288718/ /pubmed/32548525 http://dx.doi.org/10.1021/acsomega.0c01591 Text en Copyright © 2020 American Chemical Society This is an open access article published under an ACS AuthorChoice License (http://pubs.acs.org/page/policy/authorchoice_termsofuse.html) , which permits copying and redistribution of the article or any adaptations for non-commercial purposes. |
spellingShingle | Liu, Min Decomposing Mechanism of SF(6) under Positive DC Partial Discharge in the Presence of Trace H(2)O |
title | Decomposing Mechanism of SF(6) under Positive
DC Partial Discharge in the Presence of Trace H(2)O |
title_full | Decomposing Mechanism of SF(6) under Positive
DC Partial Discharge in the Presence of Trace H(2)O |
title_fullStr | Decomposing Mechanism of SF(6) under Positive
DC Partial Discharge in the Presence of Trace H(2)O |
title_full_unstemmed | Decomposing Mechanism of SF(6) under Positive
DC Partial Discharge in the Presence of Trace H(2)O |
title_short | Decomposing Mechanism of SF(6) under Positive
DC Partial Discharge in the Presence of Trace H(2)O |
title_sort | decomposing mechanism of sf(6) under positive
dc partial discharge in the presence of trace h(2)o |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7288718/ https://www.ncbi.nlm.nih.gov/pubmed/32548525 http://dx.doi.org/10.1021/acsomega.0c01591 |
work_keys_str_mv | AT liumin decomposingmechanismofsf6underpositivedcpartialdischargeinthepresenceoftraceh2o |