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Decomposing Mechanism of SF(6) under Positive DC Partial Discharge in the Presence of Trace H(2)O

[Image: see text] The influence of H(2)O on SF(6) decomposition characteristics under positive DC partial discharge (PD) is significant. To evaluate PD fault severity in DC SF(6)-insulated equipment using the production characteristics of SF(6) decomposition components, the corresponding relationshi...

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Autor principal: Liu, Min
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2020
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7288718/
https://www.ncbi.nlm.nih.gov/pubmed/32548525
http://dx.doi.org/10.1021/acsomega.0c01591
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author Liu, Min
author_facet Liu, Min
author_sort Liu, Min
collection PubMed
description [Image: see text] The influence of H(2)O on SF(6) decomposition characteristics under positive DC partial discharge (PD) is significant. To evaluate PD fault severity in DC SF(6)-insulated equipment using the production characteristics of SF(6) decomposition components, the corresponding relationship and mathematical expression between the production of SF(6) decomposition components and the H(2)O content should be identified and achieved. Thus, SF(6) decomposition experiments under positive DC PD are performed to reflect the influence of H(2)O on SF(6) decomposition components. Results show that the total discharge quantity and the discharge repetition rate averaged for 1 s decrease slightly when the H(2)O content increases from 0 to 970 ppmv and then increase when the H(2)O content increases from 970 to 5120 ppmv. The effective production rates of SO(2)F(2), SOF(2), and SO(2) increase with the H(2)O content, whereas that of SOF(4) decreases. Finally, the corresponding relationship and mathematical expression between the characteristic ratio (c(SO(2)F(2)) + c(SOF(4)))/(c(SOF(2)) + c(SO(2))) of components and the H(2)O content have been achieved, which can afford references for PD fault diagnosis in DC SF(6) gas-insulated equipment.
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spelling pubmed-72887182020-06-15 Decomposing Mechanism of SF(6) under Positive DC Partial Discharge in the Presence of Trace H(2)O Liu, Min ACS Omega [Image: see text] The influence of H(2)O on SF(6) decomposition characteristics under positive DC partial discharge (PD) is significant. To evaluate PD fault severity in DC SF(6)-insulated equipment using the production characteristics of SF(6) decomposition components, the corresponding relationship and mathematical expression between the production of SF(6) decomposition components and the H(2)O content should be identified and achieved. Thus, SF(6) decomposition experiments under positive DC PD are performed to reflect the influence of H(2)O on SF(6) decomposition components. Results show that the total discharge quantity and the discharge repetition rate averaged for 1 s decrease slightly when the H(2)O content increases from 0 to 970 ppmv and then increase when the H(2)O content increases from 970 to 5120 ppmv. The effective production rates of SO(2)F(2), SOF(2), and SO(2) increase with the H(2)O content, whereas that of SOF(4) decreases. Finally, the corresponding relationship and mathematical expression between the characteristic ratio (c(SO(2)F(2)) + c(SOF(4)))/(c(SOF(2)) + c(SO(2))) of components and the H(2)O content have been achieved, which can afford references for PD fault diagnosis in DC SF(6) gas-insulated equipment. American Chemical Society 2020-05-29 /pmc/articles/PMC7288718/ /pubmed/32548525 http://dx.doi.org/10.1021/acsomega.0c01591 Text en Copyright © 2020 American Chemical Society This is an open access article published under an ACS AuthorChoice License (http://pubs.acs.org/page/policy/authorchoice_termsofuse.html) , which permits copying and redistribution of the article or any adaptations for non-commercial purposes.
spellingShingle Liu, Min
Decomposing Mechanism of SF(6) under Positive DC Partial Discharge in the Presence of Trace H(2)O
title Decomposing Mechanism of SF(6) under Positive DC Partial Discharge in the Presence of Trace H(2)O
title_full Decomposing Mechanism of SF(6) under Positive DC Partial Discharge in the Presence of Trace H(2)O
title_fullStr Decomposing Mechanism of SF(6) under Positive DC Partial Discharge in the Presence of Trace H(2)O
title_full_unstemmed Decomposing Mechanism of SF(6) under Positive DC Partial Discharge in the Presence of Trace H(2)O
title_short Decomposing Mechanism of SF(6) under Positive DC Partial Discharge in the Presence of Trace H(2)O
title_sort decomposing mechanism of sf(6) under positive dc partial discharge in the presence of trace h(2)o
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7288718/
https://www.ncbi.nlm.nih.gov/pubmed/32548525
http://dx.doi.org/10.1021/acsomega.0c01591
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