A novel modeling approach for a generalizable photo-Fenton-based degradation of organic compounds

This work aims at proposing and validating a model that can be exploited for the future development of industrial applications (e.g., process design and control) of Fenton and photo-Fenton processes. Hence, a compromise modeling solution has been developed between the non-generalizable accuracy of t...

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Detalles Bibliográficos
Autores principales: Audino, Francesca, Pérez-Moya, Montserrat, Graells, Moisès, Espuña, Antonio, Csukas, Bela, Varga, Monika
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer Berlin Heidelberg 2020
Materias:
Research Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7293673/
https://www.ncbi.nlm.nih.gov/pubmed/32329002
http://dx.doi.org/10.1007/s11356-020-08616-4

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7293673/
https://www.ncbi.nlm.nih.gov/pubmed/32329002
http://dx.doi.org/10.1007/s11356-020-08616-4

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