Vertical Lamellae Formed by Two-Step Annealing of a Rod–Coil Liquid Crystalline Block Copolymer Thin Film

[Image: see text] Silicon-containing block copolymer thin films with high interaction parameter and etch contrast are ideal candidates to generate robust nanotemplates for advanced nanofabrication, but they typically form in-plane oriented microdomains as a result of the dissimilar surface energies...

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Detalles Bibliográficos
Autores principales: Shi, Ling-Ying, Lan, Ji, Lee, Sangho, Cheng, Li-Chen, Yager, Kevin G., Ross, Caroline A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2020
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7309319/
https://www.ncbi.nlm.nih.gov/pubmed/32182037
http://dx.doi.org/10.1021/acsnano.9b09702

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7309319/
https://www.ncbi.nlm.nih.gov/pubmed/32182037
http://dx.doi.org/10.1021/acsnano.9b09702

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