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In-situ characterization of ultrathin nickel silicides using 3D medium-energy ion scattering
Epitaxial ultrathin films are of utmost importance for state-of-the-art nanoelectronic devices, such as MOSFET transistors and non-volatile memories. At the same time, as the film thickness is reduced to a few nanometers, characterization of the materials is becoming challenging for commonly used me...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7314745/ https://www.ncbi.nlm.nih.gov/pubmed/32581281 http://dx.doi.org/10.1038/s41598-020-66464-1 |