Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry

We find that a five-phase (substrate, mixed native oxide and roughness interface layer, metal oxide thin film layer, surface ligand layer, ambient) model with two-dynamic (metal oxide thin film layer thickness and surface ligand layer void fraction) parameters (dynamic dual box model) is sufficient...

Descripción completa

Detalles Bibliográficos
Autores principales: Kilic, Ufuk, Mock, Alyssa, Sekora, Derek, Gilbert, Simeon, Valloppilly, Shah, Melendez, Giselle, Ianno, Natale, Langell, Marjorie, Schubert, Eva, Schubert, Mathias
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7316976/
https://www.ncbi.nlm.nih.gov/pubmed/32587273
http://dx.doi.org/10.1038/s41598-020-66409-8

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7316976/
https://www.ncbi.nlm.nih.gov/pubmed/32587273
http://dx.doi.org/10.1038/s41598-020-66409-8

Ejemplares similares