Generation of an X-ray nanobeam of a free-electron laser using reflective optics with speckle interferometry

Ultimate focusing of an X-ray free-electron laser (XFEL) enables the generation of ultrahigh-intensity X-ray pulses. Although sub-10 nm focusing has already been achieved using synchrotron light sources, the sub-10 nm focusing of XFEL beams remains difficult mainly because the insufficient stability...

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Detalles Bibliográficos
Autores principales: Inoue, Takato, Matsuyama, Satoshi, Yamada, Jumpei, Nakamura, Nami, Osaka, Taito, Inoue, Ichiro, Inubushi, Yuichi, Tono, Kensuke, Yumoto, Hirokatsu, Koyama, Takahisa, Ohashi, Haruhiko, Yabashi, Makina, Ishikawa, Tetsuya, Yamauchi, Kazuto
Formato: Online Artículo Texto
Lenguaje:English
Publicado: International Union of Crystallography 2020
Materias:
Research Papers
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7336172/
https://www.ncbi.nlm.nih.gov/pubmed/33565996
http://dx.doi.org/10.1107/S1600577520006980

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7336172/
https://www.ncbi.nlm.nih.gov/pubmed/33565996
http://dx.doi.org/10.1107/S1600577520006980

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