Iron-Intercalated Zirconium Diselenide Thin Films from the Low-Pressure Chemical Vapor Deposition of [Fe(η(5)-C(5)H(4)Se)(2)Zr(η(5)-C(5)H(5))(2)](2)

[Image: see text] Transition metal chalcogenide thin films of the type Fe(x)ZrSe(2) have applications in electronic devices, but their use is limited by current synthetic techniques. Here, we demonstrate the synthesis and characterization of Fe-intercalated ZrSe(2) thin films on quartz substrates us...

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Detalles Bibliográficos
Autores principales: Sanchez-Perez, Clara, Knapp, Caroline E., Colman, Ross H., Sotelo-Vazquez, Carlos, Sathasivam, Sanjayan, Oilunkaniemi, Raija, Laitinen, Risto S., Carmalt, Claire J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2020
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7345377/
https://www.ncbi.nlm.nih.gov/pubmed/32656399
http://dx.doi.org/10.1021/acsomega.0c00413

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7345377/
https://www.ncbi.nlm.nih.gov/pubmed/32656399
http://dx.doi.org/10.1021/acsomega.0c00413

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