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Iron-Intercalated Zirconium Diselenide Thin Films from the Low-Pressure Chemical Vapor Deposition of [Fe(η(5)-C(5)H(4)Se)(2)Zr(η(5)-C(5)H(5))(2)](2)
[Image: see text] Transition metal chalcogenide thin films of the type Fe(x)ZrSe(2) have applications in electronic devices, but their use is limited by current synthetic techniques. Here, we demonstrate the synthesis and characterization of Fe-intercalated ZrSe(2) thin films on quartz substrates us...
Autores principales: | Sanchez-Perez, Clara, Knapp, Caroline E., Colman, Ross H., Sotelo-Vazquez, Carlos, Sathasivam, Sanjayan, Oilunkaniemi, Raija, Laitinen, Risto S., Carmalt, Claire J. |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American Chemical Society
2020
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7345377/ https://www.ncbi.nlm.nih.gov/pubmed/32656399 http://dx.doi.org/10.1021/acsomega.0c00413 |
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