Cargando…
Low Resistance TiO(2)/p-Si Heterojunction for Tandem Solar Cells
Niobium-doped titanium dioxide (Ti(1−x)Nb(x)O(2)) films were grown on p-type Si substrates at low temperature (170 °C) using an atomic layer deposition technique. The as-deposited films were amorphous and showed low electrical conductivity. The films became electrically well-conducting and crystalli...
| Autores principales: | , , , , , , , , , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2020
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7345728/ https://www.ncbi.nlm.nih.gov/pubmed/32630580 http://dx.doi.org/10.3390/ma13122857 |