Extreme ultraviolet microscope characterization using photomask surface roughness

We demonstrate a method for characterizing the field-dependent aberrations of a full-field synchrotron-based extreme ultraviolet microscope. The statistical uniformity of the inherent, atomic-scale roughness of readily-available photomask blanks enables a self-calibrating computational procedure usi...

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Detalles Bibliográficos
Autores principales: Gunjala, Gautam, Wojdyla, Antoine, Sherwin, Stuart, Shanker, Aamod, Benk, Markus P., Goldberg, Kenneth A., Naulleau, Patrick P., Waller, Laura
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7363931/
https://www.ncbi.nlm.nih.gov/pubmed/32669602
http://dx.doi.org/10.1038/s41598-020-68588-w

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7363931/
https://www.ncbi.nlm.nih.gov/pubmed/32669602
http://dx.doi.org/10.1038/s41598-020-68588-w

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