Atmospheric Pressure Plasma Deposition of TiO(2): A Review

Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO(2)) has a wide range of applications in electronics, solar cells, and photoca...

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Detalles Bibliográficos
Autores principales: Banerjee, Soumya, Adhikari, Ek, Sapkota, Pitambar, Sebastian, Amal, Ptasinska, Sylwia
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7372480/
https://www.ncbi.nlm.nih.gov/pubmed/32629902
http://dx.doi.org/10.3390/ma13132931

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7372480/
https://www.ncbi.nlm.nih.gov/pubmed/32629902
http://dx.doi.org/10.3390/ma13132931

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