Rolling Nanoelectrode Lithography

Non-uniformity and low throughput issues severely limit the application of nanoelectrode lithography for large area nanopatterning. This paper proposes, for the first time, a new rolling nanoelectrode lithography approach to overcome these challenges. A test-bed was developed to realize uniform pres...

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Detalles Bibliográficos
Autores principales: Hasan, Rashed Md. Murad, Luo, Xichun, Sun, Jining
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7407333/
https://www.ncbi.nlm.nih.gov/pubmed/32630089
http://dx.doi.org/10.3390/mi11070656

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7407333/
https://www.ncbi.nlm.nih.gov/pubmed/32630089
http://dx.doi.org/10.3390/mi11070656

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