Effect of Annealing Temperature on Spatial Atomic Layer Deposited Titanium Oxide and Its Application in Perovskite Solar Cells

In this study, spatial atomic layer deposition (sALD) is employed to prepare titanium dioxide (TiO(2)) thin films by using titanium tetraisopropoxide and water as metal and water precursors, respectively. The post-annealing temperature is varied to investigate its effect on the properties of the TiO...

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Detalles Bibliográficos
Autores principales: Hsu, Chia-Hsun, Chen, Ka-Te, Huang, Pao-Hsun, Wu, Wan-Yu, Zhang, Xiao-Ying, Wang, Chen, Liang, Lu-Sheng, Gao, Peng, Qiu, Yu, Lien, Shui-Yang, Su, Zhan-Bo, Chen, Zi-Rong, Zhu, Wen-Zhang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7408533/
https://www.ncbi.nlm.nih.gov/pubmed/32635629
http://dx.doi.org/10.3390/nano10071322

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7408533/
https://www.ncbi.nlm.nih.gov/pubmed/32635629
http://dx.doi.org/10.3390/nano10071322

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