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Statistical insights into the reaction of fluorine atoms with silicon
The dependences of silicon etching rate on the concentration of F atoms are investigated theoretically. The nonlinear regression analysis of the experimental data indicates that the reaction of F atoms with silicon is 2nd overall order reaction. The relationship between overall reaction order and ki...
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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Nature Publishing Group UK
2020
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7423933/ https://www.ncbi.nlm.nih.gov/pubmed/32788642 http://dx.doi.org/10.1038/s41598-020-70432-0 |