Surface Characterization of MoS(2) Atomic Layers Mechanically Exfoliated on a Si Substrate

Mo disulfide overlayers with the thickness exceeding 1.77 nm were obtained on Si substrates through mechanical exfoliation. The resulting Mo disulfide flakes were then analyzed ex situ using combination of Auger electron spectroscopy (AES), elastic-peak electron spectroscopy (EPES) and scanning elec...

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Detalles Bibliográficos
Autores principales: Krawczyk, Mirosław, Pisarek, Marcin, Szoszkiewicz, Robert, Jablonski, Aleksander
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7475815/
https://www.ncbi.nlm.nih.gov/pubmed/32823911
http://dx.doi.org/10.3390/ma13163595

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7475815/
https://www.ncbi.nlm.nih.gov/pubmed/32823911
http://dx.doi.org/10.3390/ma13163595

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