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Ultimate suppression of thermal transport in amorphous silicon nitride by phononic nanostructure
Engineering the thermal conductivity of amorphous materials is highly essential for the thermal management of future electronic devices. Here, we demonstrate the impact of ultrafine nanostructuring on the thermal conductivity reduction of amorphous silicon nitride (a-Si(3)N(4)) thin films, in which...
| Autores principales: | , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Association for the Advancement of Science
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7518865/ https://www.ncbi.nlm.nih.gov/pubmed/32978150 http://dx.doi.org/10.1126/sciadv.abc0075 |