Low-Temperature Atomic Layer Deposited Oxide on Titanium Nitride Electrodes Enables Culture and Physiological Recording of Electrogenic Cells

The performance of electrode arrays insulated by low-temperature atomic layer deposited (ALD) titanium dioxide (TiO(2)) or hafnium dioxide (HfO(2)) for culture of electrogenic cells and for recording of extracellular action potentials is investigated. If successful, such insulation may be considered...

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Detalles Bibliográficos
Autores principales: Dollt, Michele, Reh, Miriam, Metzger, Michael, Heusel, Gerhard, Kriebel, Martin, Bucher, Volker, Zeck, Günther
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Frontiers Media S.A. 2020
Materias:
Neuroscience
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7530285/
https://www.ncbi.nlm.nih.gov/pubmed/33071735
http://dx.doi.org/10.3389/fnins.2020.552876

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7530285/
https://www.ncbi.nlm.nih.gov/pubmed/33071735
http://dx.doi.org/10.3389/fnins.2020.552876

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