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Low-Temperature Atomic Layer Deposited Oxide on Titanium Nitride Electrodes Enables Culture and Physiological Recording of Electrogenic Cells
The performance of electrode arrays insulated by low-temperature atomic layer deposited (ALD) titanium dioxide (TiO(2)) or hafnium dioxide (HfO(2)) for culture of electrogenic cells and for recording of extracellular action potentials is investigated. If successful, such insulation may be considered...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Frontiers Media S.A.
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7530285/ https://www.ncbi.nlm.nih.gov/pubmed/33071735 http://dx.doi.org/10.3389/fnins.2020.552876 |