Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting

Transition‐metal phosphides (TMP) prepared by atomic layer deposition (ALD) are reported for the first time. Ultrathin Co‐P films were deposited by using PH(3) plasma as the phosphorus source and an extra H(2) plasma step to remove excess P in the growing films. The optimized ALD process proceeded b...

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Detalles Bibliográficos
Autores principales: Zhang, Haojie, Hagen, Dirk J., Li, Xiaopeng, Graff, Andreas, Heyroth, Frank, Fuhrmann, Bodo, Kostanovskiy, Ilya, Schweizer, Stefan L., Caddeo, Francesco, Maijenburg, A. Wouter, Parkin, Stuart, Wehrspohn, Ralf B.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2020
Materias:
Communications
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7540345/
https://www.ncbi.nlm.nih.gov/pubmed/32608102
http://dx.doi.org/10.1002/anie.202002280

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7540345/
https://www.ncbi.nlm.nih.gov/pubmed/32608102
http://dx.doi.org/10.1002/anie.202002280

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