Development, Processing and Applications of a UV-Curable Polymer with Surface Active Thiol Groups

We present here a novel resist formulation with active thiol groups at the surface. The material is UV curable, and can be patterned at the micro- and nanoscale by UV nanoimprint lithography. The resist formulation development, its processing, patterning and surface characterization are presented he...

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Detalles Bibliográficos
Autores principales: Müller, Manuel, Nasri, Rukan, Tiemann, Lars, Fernandez-Cuesta, Irene
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7558128/
https://www.ncbi.nlm.nih.gov/pubmed/32937782
http://dx.doi.org/10.3390/nano10091829

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7558128/
https://www.ncbi.nlm.nih.gov/pubmed/32937782
http://dx.doi.org/10.3390/nano10091829

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