Suppression of Oxygen Vacancy Defects in sALD-ZnO Films Annealed in Different Conditions

Zinc oxide (ZnO) has drawn much attention due to its excellent optical and electrical properties. In this study, ZnO film was prepared by a high-deposition-rate spatial atomic layer deposition (ALD) and subjected to a post-annealing process to suppress the intrinsic defects and improve the crystalli...

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Detalles Bibliográficos
Autores principales: Zhao, Ming-Jie, Sun, Zhi-Tao, Zhang, Zhi-Xuan, Geng, Xin-Peng, Wu, Wan-Yu, Lien, Shui-Yang, Zhu, Wen-Zhang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7558328/
https://www.ncbi.nlm.nih.gov/pubmed/32899677
http://dx.doi.org/10.3390/ma13183910

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7558328/
https://www.ncbi.nlm.nih.gov/pubmed/32899677
http://dx.doi.org/10.3390/ma13183910

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