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Growth and Characterization of Ternary Hf(x)Ta(y)O(z) Films via Nitrogen-Infused Wet Oxidation

[Image: see text] Nitrogen-infused wet oxidation at different temperatures (400–1000 °C) was employed to transform tantalum–hafnia to hafnium-doped tantalum oxide films. High-temperature wet oxidation at 1000 °C marked an onset of crystallization occurring in the film, accompanied with the formation...

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Detalles Bibliográficos
Autores principales: Quah, Hock Jin, Ahmad, Farah Hayati, Lim, Way Foong, Hassan, Zainuriah
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2020
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7581075/
https://www.ncbi.nlm.nih.gov/pubmed/33110962
http://dx.doi.org/10.1021/acsomega.0c02120