Fabrication of Nanocrystalline Silicon Thin Films Utilized for Optoelectronic Devices Prepared by Thermal Vacuum Evaporation

[Image: see text] Metal-induced crystallization of amorphous silicon is a promising technique for developing high-quality and cheap optoelectronic devices. Many attempts tried to enhance the crystal growth of polycrystalline silicon via aluminum-induced crystallization at different annealing times a...

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Detalles Bibliográficos
Autores principales: Abo Ghazala, Magdy S., Othman, Hosam A., Sharaf El-Deen, Lobna M., Nawwar, Mohamed A., Kashyout, Abd El-hady B.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2020
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7594337/
https://www.ncbi.nlm.nih.gov/pubmed/33134727
http://dx.doi.org/10.1021/acsomega.0c04206

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7594337/
https://www.ncbi.nlm.nih.gov/pubmed/33134727
http://dx.doi.org/10.1021/acsomega.0c04206

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