Transfer Durability of Line-Patterned Replica Mold Made of High-Hardness UV-Curable Resin

Ultraviolet nanoimprint lithography (UV-NIL) requires high durability of the mold for the mass production of nanostructures. To evaluate the durability of a line-patterned replica mold made of high-hardness UV curable resin, repetitive transfer and contact angle measurements of the replica mold were...

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Detalles Bibliográficos
Autores principales: Marumo, Tetsuma, Hiwasa, Shin, Taniguchi, Jun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7601754/
https://www.ncbi.nlm.nih.gov/pubmed/33019541
http://dx.doi.org/10.3390/nano10101956

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7601754/
https://www.ncbi.nlm.nih.gov/pubmed/33019541
http://dx.doi.org/10.3390/nano10101956

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