Damage-free highly efficient plasma-assisted polishing of a 20-mm square large mosaic single crystal diamond substrate

Plasma-assisted polishing (PAP) as a damage-free and highly efficient polishing technique has been widely applied to difficult-to-machine wide-gap semiconductor materials such as 4H-SiC (0001) and GaN (0001). In this study, a 20-mm square large mosaic single crystal diamond (SCD) substrate synthesiz...

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Detalles Bibliográficos
Autores principales: Liu, Nian, Sugawara, Kohki, Yoshitaka, Naoya, Yamada, Hideaki, Takeuchi, Daisuke, Akabane, Yuko, Fujino, Kenichi, Kawai, Kentaro, Arima, Kenta, Yamamura, Kazuya
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7655941/
https://www.ncbi.nlm.nih.gov/pubmed/33173076
http://dx.doi.org/10.1038/s41598-020-76430-6

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7655941/
https://www.ncbi.nlm.nih.gov/pubmed/33173076
http://dx.doi.org/10.1038/s41598-020-76430-6

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