Large-Scale Synthesis of Highly Uniform Silicon Nanowire Arrays Using Metal-Assisted Chemical Etching

[Image: see text] The combination of metal-assisted chemical etching (MACE) with colloidal lithography has emerged as a simple and cost-effective approach to nanostructure silicon. It is especially efficient at synthesizing Si micro- and nanowire arrays using a catalytic metal mesh, which sinks into...

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Detalles Bibliográficos
Autores principales: Wendisch, Fedja J., Rey, Marcel, Vogel, Nicolas, Bourret, Gilles R.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2020
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7659364/
https://www.ncbi.nlm.nih.gov/pubmed/33191979
http://dx.doi.org/10.1021/acs.chemmater.0c03593

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7659364/
https://www.ncbi.nlm.nih.gov/pubmed/33191979
http://dx.doi.org/10.1021/acs.chemmater.0c03593

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