Reactive Plasma N-Doping of Amorphous Carbon Electrodes: Decoupling Disorder and Chemical Effects on Capacitive and Electrocatalytic Performance

Nitrogen-free amorphous carbon thin films prepared via sputtering followed by graphitization, were used as precursor materials for the creation of N-doped carbon electrodes with varying degrees of amorphization. Incorporation of N-sites was achieved via nitrogen plasma treatments which resulted in b...

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Detalles Bibliográficos
Autores principales: Hoque, Md. Khairul, Behan, James A., Creel, James, Lunney, James G., Perova, Tatiana S., Colavita, Paula E.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Frontiers Media S.A. 2020
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7670066/
https://www.ncbi.nlm.nih.gov/pubmed/33240854
http://dx.doi.org/10.3389/fchem.2020.593932

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7670066/
https://www.ncbi.nlm.nih.gov/pubmed/33240854
http://dx.doi.org/10.3389/fchem.2020.593932

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