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Reactive Plasma N-Doping of Amorphous Carbon Electrodes: Decoupling Disorder and Chemical Effects on Capacitive and Electrocatalytic Performance
Nitrogen-free amorphous carbon thin films prepared via sputtering followed by graphitization, were used as precursor materials for the creation of N-doped carbon electrodes with varying degrees of amorphization. Incorporation of N-sites was achieved via nitrogen plasma treatments which resulted in b...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Frontiers Media S.A.
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7670066/ https://www.ncbi.nlm.nih.gov/pubmed/33240854 http://dx.doi.org/10.3389/fchem.2020.593932 |