A 2D Waveguide Method for Lithography Simulation of Thick SU-8 Photoresist

Due to the increasing complexity of microelectromechanical system (MEMS) devices, the accuracy and precision of two-dimensional microstructures of SU-8 negative thick photoresist have drawn more attention with the rapid development of UV lithography technology. This paper presents a high-precision l...

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Detalles Bibliográficos
Autores principales: Geng, Zi-Chen, Zhou, Zai-Fa, Dai, Hui, Huang, Qing-An
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7693592/
https://www.ncbi.nlm.nih.gov/pubmed/33138304
http://dx.doi.org/10.3390/mi11110972

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7693592/
https://www.ncbi.nlm.nih.gov/pubmed/33138304
http://dx.doi.org/10.3390/mi11110972

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