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A 2D Waveguide Method for Lithography Simulation of Thick SU-8 Photoresist
Due to the increasing complexity of microelectromechanical system (MEMS) devices, the accuracy and precision of two-dimensional microstructures of SU-8 negative thick photoresist have drawn more attention with the rapid development of UV lithography technology. This paper presents a high-precision l...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2020
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7693592/ https://www.ncbi.nlm.nih.gov/pubmed/33138304 http://dx.doi.org/10.3390/mi11110972 |
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author | Geng, Zi-Chen Zhou, Zai-Fa Dai, Hui Huang, Qing-An |
author_facet | Geng, Zi-Chen Zhou, Zai-Fa Dai, Hui Huang, Qing-An |
author_sort | Geng, Zi-Chen |
collection | PubMed |
description | Due to the increasing complexity of microelectromechanical system (MEMS) devices, the accuracy and precision of two-dimensional microstructures of SU-8 negative thick photoresist have drawn more attention with the rapid development of UV lithography technology. This paper presents a high-precision lithography simulation model for thick SU-8 photoresist based on waveguide method to calculate light intensity in the photoresist and predict the profiles of developed SU-8 structures in two dimension. This method is based on rigorous electromagnetic field theory. The parameters that have significant influence on profile quality were studied. Using this model, the light intensity distribution was calculated, and the final resist morphology corresponding to the simulation results was examined. A series of simulations and experiments were conducted to verify the validity of the model. The simulation results were found to be in good agreement with the experimental results, and the simulation system demonstrated high accuracy and efficiency, with complex cases being efficiently handled. |
format | Online Article Text |
id | pubmed-7693592 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2020 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-76935922020-11-28 A 2D Waveguide Method for Lithography Simulation of Thick SU-8 Photoresist Geng, Zi-Chen Zhou, Zai-Fa Dai, Hui Huang, Qing-An Micromachines (Basel) Article Due to the increasing complexity of microelectromechanical system (MEMS) devices, the accuracy and precision of two-dimensional microstructures of SU-8 negative thick photoresist have drawn more attention with the rapid development of UV lithography technology. This paper presents a high-precision lithography simulation model for thick SU-8 photoresist based on waveguide method to calculate light intensity in the photoresist and predict the profiles of developed SU-8 structures in two dimension. This method is based on rigorous electromagnetic field theory. The parameters that have significant influence on profile quality were studied. Using this model, the light intensity distribution was calculated, and the final resist morphology corresponding to the simulation results was examined. A series of simulations and experiments were conducted to verify the validity of the model. The simulation results were found to be in good agreement with the experimental results, and the simulation system demonstrated high accuracy and efficiency, with complex cases being efficiently handled. MDPI 2020-10-29 /pmc/articles/PMC7693592/ /pubmed/33138304 http://dx.doi.org/10.3390/mi11110972 Text en © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Geng, Zi-Chen Zhou, Zai-Fa Dai, Hui Huang, Qing-An A 2D Waveguide Method for Lithography Simulation of Thick SU-8 Photoresist |
title | A 2D Waveguide Method for Lithography Simulation of Thick SU-8 Photoresist |
title_full | A 2D Waveguide Method for Lithography Simulation of Thick SU-8 Photoresist |
title_fullStr | A 2D Waveguide Method for Lithography Simulation of Thick SU-8 Photoresist |
title_full_unstemmed | A 2D Waveguide Method for Lithography Simulation of Thick SU-8 Photoresist |
title_short | A 2D Waveguide Method for Lithography Simulation of Thick SU-8 Photoresist |
title_sort | 2d waveguide method for lithography simulation of thick su-8 photoresist |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7693592/ https://www.ncbi.nlm.nih.gov/pubmed/33138304 http://dx.doi.org/10.3390/mi11110972 |
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