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A 2D Waveguide Method for Lithography Simulation of Thick SU-8 Photoresist
Due to the increasing complexity of microelectromechanical system (MEMS) devices, the accuracy and precision of two-dimensional microstructures of SU-8 negative thick photoresist have drawn more attention with the rapid development of UV lithography technology. This paper presents a high-precision l...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7693592/ https://www.ncbi.nlm.nih.gov/pubmed/33138304 http://dx.doi.org/10.3390/mi11110972 |