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On the Formation of Black Silicon Features by Plasma-Less Etching of Silicon in Molecular Fluorine Gas
In this paper, we study the plasma-less etching of crystalline silicon (c-Si) by F(2)/N(2) gas mixture at moderately elevated temperatures. The etching is performed in an inline etching tool, which is specifically developed to lower costs for products needing a high volume manufacturing etching plat...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7695004/ https://www.ncbi.nlm.nih.gov/pubmed/33172194 http://dx.doi.org/10.3390/nano10112214 |