Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO(2) Thin Films and Their Insulator–Metal Transition Behavior. Materials 2019, 12, 2160

Detalles Bibliográficos
Autores principales: Zhang, Chunzi, Gunes, Ozan, Li, Yuanshi, Cui, Xiaoyu, Mohammadtaheri, Masoud, Wen, Shi-Jie, Wong, Rick, Yang, Qiaoqin, Kasap, Safa
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Erratum
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7697904/
https://www.ncbi.nlm.nih.gov/pubmed/33203063
http://dx.doi.org/10.3390/ma13225132

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7697904/
https://www.ncbi.nlm.nih.gov/pubmed/33203063
http://dx.doi.org/10.3390/ma13225132

Ejemplares similares