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Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO(2) Thin Films and Their Insulator–Metal Transition Behavior. Materials 2019, 12, 2160

Detalles Bibliográficos
Autores principales:	Zhang, Chunzi, Gunes, Ozan, Li, Yuanshi, Cui, Xiaoyu, Mohammadtaheri, Masoud, Wen, Shi-Jie, Wong, Rick, Yang, Qiaoqin, Kasap, Safa
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2020
Materias:	Erratum
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7697904/ https://www.ncbi.nlm.nih.gov/pubmed/33203063 http://dx.doi.org/10.3390/ma13225132

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