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Tuning Stoichiometry and Structure of Pd-WO(3−x) Thin Films for Hydrogen Gas Sensing by High-Power Impulse Magnetron Sputtering
By tuning the deposition parameters of reactive high-power impulse magnetron sputtering, specifically the pulse length, we were able to prepare WO(3−x) films with various stoichiometry and structure. Subsequently, the films were annealed in air at moderate temperature (350 °C). We demonstrate that t...
Autores principales: | , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2020
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7697909/ https://www.ncbi.nlm.nih.gov/pubmed/33198193 http://dx.doi.org/10.3390/ma13225101 |