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Tuning Stoichiometry and Structure of Pd-WO(3−x) Thin Films for Hydrogen Gas Sensing by High-Power Impulse Magnetron Sputtering

By tuning the deposition parameters of reactive high-power impulse magnetron sputtering, specifically the pulse length, we were able to prepare WO(3−x) films with various stoichiometry and structure. Subsequently, the films were annealed in air at moderate temperature (350 °C). We demonstrate that t...

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Detalles Bibliográficos
Autores principales:	Kumar, Nirmal, Haviar, Stanislav, Rezek, Jiří, Baroch, Pavel, Zeman, Petr
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2020
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7697909/ https://www.ncbi.nlm.nih.gov/pubmed/33198193 http://dx.doi.org/10.3390/ma13225101

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