Wavefront Sensing for Evaluation of Extreme Ultraviolet Microscopy

Wavefront analysis is a fast and reliable technique for the alignment and characterization of optics in the visible, but also in the extreme ultraviolet (EUV) and X-ray regions. However, the technique poses a number of challenges when used for optical systems with numerical apertures (NA) > 0.1....

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Detalles Bibliográficos
Autores principales: Ruiz-Lopez, Mabel, Mehrjoo, Masoud, Keitel, Barbara, Plönjes, Elke, Alj, Domenico, Dovillaire, Guillaume, Li, Lu, Zeitoun, Philippe
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Letter
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7698259/
https://www.ncbi.nlm.nih.gov/pubmed/33182797
http://dx.doi.org/10.3390/s20226426

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7698259/
https://www.ncbi.nlm.nih.gov/pubmed/33182797
http://dx.doi.org/10.3390/s20226426

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