Thin films of formamidinium lead iodide (FAPI) deposited using aerosol assisted chemical vapour deposition (AACVD)

Formamidinium lead iodide (CH(NH(2))(2)PbI(3), FAPI) thin films have been deposited on glass substrates at 150 °C using ambient pressure aerosol assisted chemical vapour deposition (AACVD). The films have been analysed by a range of techniques including powder X-ray diffraction (pXRD), scanning elec...

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Detalles Bibliográficos
Autores principales: Alam, Firoz, Lewis, David J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7747716/
https://www.ncbi.nlm.nih.gov/pubmed/33335260
http://dx.doi.org/10.1038/s41598-020-79291-1

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7747716/
https://www.ncbi.nlm.nih.gov/pubmed/33335260
http://dx.doi.org/10.1038/s41598-020-79291-1

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