In-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic

This article presents a millimeter-wave diagnostic for the in-situ monitoring of liquid metal jetting additive manufacturing systems. The diagnostic leverages a T-junction waveguide device to monitor impedance changes due to jetted metal droplets in real time. An analytical formulation for the time-...

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Detalles Bibliográficos
Autores principales: Chang, Tammy, Mukherjee, Saptarshi, Watkins, Nicholas N., Stobbe, David M., Mays, Owen, Baluyot, Emer V., Pascall, Andrew J., Tringe, Joseph W.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7749153/
https://www.ncbi.nlm.nih.gov/pubmed/33339896
http://dx.doi.org/10.1038/s41598-020-79266-2

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7749153/
https://www.ncbi.nlm.nih.gov/pubmed/33339896
http://dx.doi.org/10.1038/s41598-020-79266-2

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