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In-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic
This article presents a millimeter-wave diagnostic for the in-situ monitoring of liquid metal jetting additive manufacturing systems. The diagnostic leverages a T-junction waveguide device to monitor impedance changes due to jetted metal droplets in real time. An analytical formulation for the time-...
Autores principales: | Chang, Tammy, Mukherjee, Saptarshi, Watkins, Nicholas N., Stobbe, David M., Mays, Owen, Baluyot, Emer V., Pascall, Andrew J., Tringe, Joseph W. |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2020
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7749153/ https://www.ncbi.nlm.nih.gov/pubmed/33339896 http://dx.doi.org/10.1038/s41598-020-79266-2 |
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