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Direct MOCVD Growth of Iron Oxide on Three‐Dimensional Nickel Foam as Electrode for the Oxygen Evolution Reaction
Iron oxide thin films were grown directly on three‐dimensional nickel foam via metalorganic chemical vapor deposition (MOCVD) in the temperature range of 250–450 °C using Fe(CO)(5) as precursor. Iron oxide (α‐Fe(2)O(3)) films were formed at low substrate temperatures (250–350 °C), whereas the additi...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
John Wiley and Sons Inc.
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7756718/ https://www.ncbi.nlm.nih.gov/pubmed/32926764 http://dx.doi.org/10.1002/cssc.202001896 |