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Direct MOCVD Growth of Iron Oxide on Three‐Dimensional Nickel Foam as Electrode for the Oxygen Evolution Reaction

Iron oxide thin films were grown directly on three‐dimensional nickel foam via metalorganic chemical vapor deposition (MOCVD) in the temperature range of 250–450 °C using Fe(CO)(5) as precursor. Iron oxide (α‐Fe(2)O(3)) films were formed at low substrate temperatures (250–350 °C), whereas the additi...

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Detalles Bibliográficos
Autores principales:	Stienen, Christian, Bendt, Georg
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	John Wiley and Sons Inc. 2020
Materias:	Full Papers
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7756718/ https://www.ncbi.nlm.nih.gov/pubmed/32926764 http://dx.doi.org/10.1002/cssc.202001896

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