Redeposition-Free Deep Etching in Small KY(WO(4))(2) Samples

KY(WO(4))(2) is a promising material for on-chip laser sources. Deep etching of small KY(WO(4))(2) samples in combination with various thin film deposition techniques is desirable for the manufacturing of such devices. There are, however, several difficulties that need to be overcome before deep etc...

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Detalles Bibliográficos
Autores principales: Mikalsen Martinussen, Simen, Frentrop, Raimond N., Dijkstra, Meindert, Garcia-Blanco, Sonia Maria
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7760692/
https://www.ncbi.nlm.nih.gov/pubmed/33255494
http://dx.doi.org/10.3390/mi11121033

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7760692/
https://www.ncbi.nlm.nih.gov/pubmed/33255494
http://dx.doi.org/10.3390/mi11121033

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