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Silicon-Carbide (SiC) Nanocrystal Technology and Characterization and Its Applications in Memory Structures

Colloidal cubic silicon-carbide nanocrystals have been fabricated, characterized, and introduced into metal–insulator–semiconductor and metal–insulator–metal structures based on hafnium oxide layers. The fabricated structures were characterized through the stress-and-sense measurements in terms of d...

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Detalles Bibliográficos
Autores principales: Mazurak, Andrzej, Mroczyński, Robert, Beke, David, Gali, Adam
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7761177/
https://www.ncbi.nlm.nih.gov/pubmed/33260489
http://dx.doi.org/10.3390/nano10122387
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author Mazurak, Andrzej
Mroczyński, Robert
Beke, David
Gali, Adam
author_facet Mazurak, Andrzej
Mroczyński, Robert
Beke, David
Gali, Adam
author_sort Mazurak, Andrzej
collection PubMed
description Colloidal cubic silicon-carbide nanocrystals have been fabricated, characterized, and introduced into metal–insulator–semiconductor and metal–insulator–metal structures based on hafnium oxide layers. The fabricated structures were characterized through the stress-and-sense measurements in terms of device capacitance, flat-band voltage shift, switching characteristics, and retention time. The examined electrical performance of the sample structures has demonstrated the feasibility of the application of both types of structures based on SiC nanoparticles in memory devices.
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spelling pubmed-77611772020-12-26 Silicon-Carbide (SiC) Nanocrystal Technology and Characterization and Its Applications in Memory Structures Mazurak, Andrzej Mroczyński, Robert Beke, David Gali, Adam Nanomaterials (Basel) Article Colloidal cubic silicon-carbide nanocrystals have been fabricated, characterized, and introduced into metal–insulator–semiconductor and metal–insulator–metal structures based on hafnium oxide layers. The fabricated structures were characterized through the stress-and-sense measurements in terms of device capacitance, flat-band voltage shift, switching characteristics, and retention time. The examined electrical performance of the sample structures has demonstrated the feasibility of the application of both types of structures based on SiC nanoparticles in memory devices. MDPI 2020-11-29 /pmc/articles/PMC7761177/ /pubmed/33260489 http://dx.doi.org/10.3390/nano10122387 Text en © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Mazurak, Andrzej
Mroczyński, Robert
Beke, David
Gali, Adam
Silicon-Carbide (SiC) Nanocrystal Technology and Characterization and Its Applications in Memory Structures
title Silicon-Carbide (SiC) Nanocrystal Technology and Characterization and Its Applications in Memory Structures
title_full Silicon-Carbide (SiC) Nanocrystal Technology and Characterization and Its Applications in Memory Structures
title_fullStr Silicon-Carbide (SiC) Nanocrystal Technology and Characterization and Its Applications in Memory Structures
title_full_unstemmed Silicon-Carbide (SiC) Nanocrystal Technology and Characterization and Its Applications in Memory Structures
title_short Silicon-Carbide (SiC) Nanocrystal Technology and Characterization and Its Applications in Memory Structures
title_sort silicon-carbide (sic) nanocrystal technology and characterization and its applications in memory structures
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7761177/
https://www.ncbi.nlm.nih.gov/pubmed/33260489
http://dx.doi.org/10.3390/nano10122387
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