Resist-Free Directed Self-Assembly Chemo-Epitaxy Approach for Line/Space Patterning

This work reports a novel, simple, and resist-free chemo-epitaxy process permitting the directed self-assembly (DSA) of lamella polystyrene-block-polymethylmethacrylate (PS-b-PMMA) block copolymers (BCPs) on a 300 mm wafer. 193i lithography is used to manufacture topographical guiding silicon oxide...

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Detalles Bibliográficos
Autores principales: Giammaria, Tommaso Jacopo, Gharbi, Ahmed, Paquet, Anne, Nealey, Paul, Tiron, Raluca
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7762273/
https://www.ncbi.nlm.nih.gov/pubmed/33297348
http://dx.doi.org/10.3390/nano10122443

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7762273/
https://www.ncbi.nlm.nih.gov/pubmed/33297348
http://dx.doi.org/10.3390/nano10122443

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