Dielectric Response Spectroscopy as Means to Investigate Interfacial Effects for Ultra-Thin Film Polymer-Based High NA EUV Lithography

Extreme ultra-violet lithography (EUVL) is the leading-edge technology to produce advanced nanoelectronics. The further development of EUVL is heavily based on implementing the so-called high numerical aperture (NA) EUVL, which will enable even smaller pitches up to 8 nm half pitch (HP). In anticipa...

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Detalles Bibliográficos
Autores principales: Severi, Joren, De Simone, Danilo, De Gendt, Stefan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7762983/
https://www.ncbi.nlm.nih.gov/pubmed/33322737
http://dx.doi.org/10.3390/polym12122971

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7762983/
https://www.ncbi.nlm.nih.gov/pubmed/33322737
http://dx.doi.org/10.3390/polym12122971

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