Evaluation of ion/electron beam induced deposition for electrical connection using a modern focused ion beam system

Focused ion beam method, which has excellent capabilities such as local deposition and selective etching, is widely used for micro-electromechanical system (MEMS)-based in situ transmission electron microscopy (TEM) sample fabrication. Among the MEMS chips in which one can apply various external sti...

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Detalles Bibliográficos
Autores principales: An, Byeong-Seon, Kwon, Yena, Oh, Jin-Su, Shin, Yeon-Ju, Ju, Jae-seon, Yang, Cheol-Woong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer Singapore 2019
Materias:
Technical Report
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7818281/
https://www.ncbi.nlm.nih.gov/pubmed/33580325
http://dx.doi.org/10.1186/s42649-019-0008-2

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7818281/
https://www.ncbi.nlm.nih.gov/pubmed/33580325
http://dx.doi.org/10.1186/s42649-019-0008-2

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