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Microstructural evolution of tantalum nitride thin films synthesized by inductively coupled plasma sputtering
Tantalum nitride (TaN(x)) thin films were grown utilizing an inductively coupled plasma (ICP) assisted direct current (DC) sputtering, and 20–100% improved microhardness values were obtained. The detailed microstructural changes of the TaN(x) films were characterized utilizing transmission electron...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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Springer Singapore
2020
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7818345/ https://www.ncbi.nlm.nih.gov/pubmed/33580437 http://dx.doi.org/10.1186/s42649-020-00026-7 |