Factors associated with mask wearing among psychiatric inpatients during the COVID-19 pandemic

Detalles Bibliográficos
Autores principales: Jung, Ha-Ran, Park, Cheol, Kim, Mina, Jhon, Min, Kim, Ju-Wan, Ryu, Seunghyong, Lee, Ju-Yeon, Kim, Jae-Min, Park, Kyung-Hwa, Jung, Sook-In, Yoon, Bo-Hyun, Kim, Sung-Wan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Elsevier B.V. 2021
Materias:
Invited Commentary
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7831677/
https://www.ncbi.nlm.nih.gov/pubmed/33476952
http://dx.doi.org/10.1016/j.schres.2020.12.029

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7831677/
https://www.ncbi.nlm.nih.gov/pubmed/33476952
http://dx.doi.org/10.1016/j.schres.2020.12.029

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